Equipment
nm Suess Microtec MA4 © LS MNE / TU Dortmund Description: UV light exposure system, mask aligner Features: Structure widths down to 0,6 µm on 4 inch substrates Suess Microtec MA4 © LS MNE / TU Dortmund [...] SPS supported custom design Features: Provides O 2 , N 2 , Ar, Cl 2 , SiCl 4 , H 2 , N 2 O, CF 4 , CHF 3 , SF 6 , NH 3 , SiH 4 /Ar, SiH 2 Cl 2 Purita Ultrapure Water Supply © LS MNE / TU Dortmund Description: [...] Dortmund Description: Reactive Ion Etching (RIE) Features: Chlorine chamber: SF 6 , Cl 2 , CHF 4 , SiCl 4 , N2; Fluorine chamber: SF 6 , O 2 , Ar, CHF 3 , N 2 Oxford PlasmaLab 80Plus © LS MNE / TU Dortmund …
